英文名稱：The3rdInternationalConferenceonMicroelectronicsandPlasmaTechnology(ICMAP-2011)
會議時間：2011/7/4~2011/7/7
會議行業(yè)：電子電力
第三屆微電子學(xué)與等離子體技術(shù)國際會議(ICMAP-2011)會議背景：
The3rdInternationalConferenceonMicroelectronicsandPlasmaTechnology(ICMAP-2011)willbeheldduringtheperiodofJuly4-7,2011inDalian,China.Theconferenceisintendedtoprovideanopenforumtoreportonrecenttechnicaladvancesofplasma-relateddisciplineswithstrongindustrialapplicationbackground,discusskeyissuesandidentifyfuturedevelopment.Theconferencescopewillincludeavarietyofprocessingtechnologiesrelatedtosemiconductor,display,andenergyconversiondevices,newlydevelopedmaterials,bio-medicalapplications,andplasmageneration,plasmadiagnosticsandsimulation,etc.
第三屆微電子學(xué)與等離子體技術(shù)國際會議(ICMAP-2011)征文要求：
Theconferenceincludesinvitedandcontributedpapersonsomeorallofthefollowingtopics.

Materialsandprocessesforsemiconductordevices
Plasmatechnologyfornano-scaleSidevices
Thinfilmspreparedbyplasmatechnology
Plasmaetchingtechnology
Nano-materialsandnano-scaledevices
New-conceptmaterials,processes,anddevices
Materialsandprocessesfordisplaydevices
Processingforflatpaneldisplaydevices
Novelthinfilmtransistorsfordisplaybackplanes
Advancedflexibledisplaytechnology
Nextgenerationdisplaydevices
Materialsandprocessesforenergyconversiondevices
High-efficiencysolarcells
ThinfilmsolarcellswithPECVDtechnology
Newmaterialsandprocessingtechnologiesforsolarcells
Newmaterialsforenergyconversionandstorage
Plasmaforbio-medicalapplications
Bio-plasmassources
Plasma-Biomaterialsinteraction
Plasmamedicine
Plasmagenerationsandsimulations
Novelplasmasources
Plasmasimulations
Plasmadiagnostics
第三屆微電子學(xué)與等離子體技術(shù)國際會議(ICMAP-2011)聯(lián)系方式：
郵編：116024
地址：SchoolofPhysics&OptoelectronicEngineeringDalianUniversityofTechnology(DLUT),Dalian,Liaoning,116024,China
Email：[email protected]

原文地址：
http://www.fentesi.net/meeting/242.html